Online Monitoring of Silicon Wafer Surface and Edge for Metal Contamination
The Radian VPD-ICPMS (Vapor Phase Decomposition) is a high-throughput, completely automated production tool for online monitoring of metal contamination on semiconductor wafers with ultra-low detection limits. The Radian’s single process station design, ultrafast scanner, and fully integrated ICPMS makes it the fastest, most automated Vapor Phase Decomposition in the world.
Vapor Phase Decomposition, VPD and ICPMS, VPD ICP MS, icpms analysis, semiconductor wafer analysis, VPD ICPMS, metal contamination, VPD monitor